Fabrication of RF NEMS Series Switch using Surface Micromachining

H. Ur Rahman, K.Y. Chan, Y. Yang, and R. Ramer (Australia)


MEMS, NEMS, series switch, surface micromachining


The paper presents for the first time issues related to the fabrication of RF NEMS switch using surface micromachining approach. The switch is fabricated using direct electron beam lithography system and lift-off process has been used in achieving the patterned metal layers. The fabrication process was optimized by overcoming different issues like proximity effect, field stitching and high resolution 20nm gap achievement. A four metal layer surface micromachined process is discussed in details. Results related to each fabrication process are also presented.

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